ISO/DIS 19383

Atomic layer deposition — Chemical characteristics and related process specifications of atomic layer deposition precursors

This document describes the chemical characteristics and related process specifications of the atomic layer deposition precursors, including assay content, metal purity, and anion content specification.

OEN:

ISO

Langue:

English

Code(s) de l'ICS:

25.220.01

Statut:

Brouillon

Date de Publication:

1969-12-30

Numéro Standard:

ISO/DIS 19383