ISO 23170:2022

Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering

This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).

OEN:

ISO

Langue:

English

Code(s) de l'ICS:

71.040.40

Statut:

Publié

Date de Publication:

2022-06-14

Numéro Standard:

ISO 23170:2022