ISO 21859:2019

Fine ceramics (advanced ceramics, advanced technical ceramics) — Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment

This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.

OEN:

ISO

Langue:

English

Code(s) de l'ICS:

81.060.30

Statut:

Publié

Date de Publication:

2019-06-17

Numéro Standard:

ISO 21859:2019